The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Dec. 20, 2001
Applicant:
Inventors:
John Border, Walworth, NY (US);
Susan H. Bernegger, Fairport, NY (US);
John C. Pulver, Spencerport, NY (US);
Morgan A. Smith, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 2/710 ; G02B 7/02 ; G03B 2/160 ; G01B 1/100 ;
U.S. Cl.
CPC ...
G02B 2/710 ; G02B 7/02 ; G03B 2/160 ; G01B 1/100 ;
Abstract
A method of manufacturing a microlens array requires at least two fiducial marks formed on a surface of a transparent medium opposite the microlens array. Additional optical features formed on the transparent medium adjacent the microlens array enables precise locationing of fiducial marks on an opposing surface when such surface is exposed to a collimated beam of light. The location of fiducial marks using the method of the invention is about 1 micron or less.