The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Aug. 16, 2000
Applicant:
Inventors:
Walter E. Donovan, Milpitas, CA (US);
Liang Peng, Sunnyvale, CA (US);
Assignee:
Nvidia Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 1/500 ;
U.S. Cl.
CPC ...
G06T 1/500 ;
Abstract
A system, method and article of manufacture are provided for shadow mapping while rendering a primitive in a graphics pipeline. Initially, an offset operation is performed in order to generate a depth value while rendering a primitive. Further, a value of a slope associated with an edge of the primitive is identified. Thereafter, the depth value is conditionally clamped based on the value of the slope.
Donovan, Walter. (2003). System, method and article of manufacture for shadow mapping (U.S. Patent No. 6593923). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6593923
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile