The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Sep. 18, 2001
Applicant:
Inventors:
Konrad Knoll, Ludwigshafen, DE;
Wolfgang Fischer, Walldorf, DE;
Hermann Gausepohl, Mutterstadt, DE;
Jürgen Koch, Neuhofen, DE;
Josef Wünsch, Schifferstadt, DE;
Paul Naegele, Otterstadt, DE;
Assignee:
BASF Aktiengesellschaft, Ludwigshafen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
C08F / ; C08F / ;
Abstract
Block copolymers comprise at least two hard blocks S and S made from vinylaromatic monomers and, between these, at least one random soft block B/S made from vinylaromatic monomers and from dienes, where the proportion of the hard blocks is above 40% by weight, based on the total block copolymer.
Knoll, Konrad. (2003). Transparent, impact-resistant polystyrene on a styrene-butadiene block copolymer basis (U.S. Patent No. 6593430). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6593430
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile