The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Nov. 07, 2000
Wayne A. Bonin, North Oaks, MN (US);
Zine-Eddine Boutaghou, Vadnais Heights, MN (US);
Roger L. Hipwell, Jr., Eden Prairie, MN (US);
Barry D. Wissman, Eden Prairie, MN (US);
Lee Walter, Plymouth, MN (US);
Barbara J. Ihlow-Mahrer, Crystal, MN (US);
Seagate Technology, Scotts Valley, CA (US);
Abstract
A method for filling a trench extending through a microelectromechanical system (MEMS) device patterned on a wafer is disclosed. The method involves simultaneously depositing a trench-fill layer of insulating material over a first side of the wafer, over a second side of the wafer, and into the trench extending from the first side to the second side. Further, the width of the trench at the first side of the wafer and/or the second side of the wafer is variable to adjust the rate at which the trench fills.