The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Mar. 27, 2000
Hiroyuki Arioka, Nagano, JP;
TDK Corporation, Tokyo, JP;
Abstract
There are provided a spin coating method and an apparatus for forming a thin film having a uniform thickness on a substrate at a low cost in a process for manufacturing semiconductors, optical disks and the like. A coating solution is dropped onto the surface of a substrate ( ) to be coated, mounted on a horizontal turn table ( ) through a discharge nozzle ( ) and the substrate is turned to form a thin film. After the coating solution is dropped through the nozzle, a stand-by nozzle tip ( ) is soaked and held in a nozzle soaking solution ( ) having a composition near or equivalent to that of the coating solution. The crystal deposition of the solute is suppressed. Inter alia, the present invention is useful when a solution containing a solute having high crystallizability is coated.