The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2003

Filed:

Aug. 27, 2001
Applicant:
Inventors:

Ching-Tang Wang, Taipei, TW;

Mong-Ching Lin, Kaohsiung, TW;

Chih-Chen Lin, Ping-Tong, TW;

Yung-Hsiang Chou, Ping-Tong, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/100 ;
U.S. Cl.
CPC ...
B32B 3/100 ;
Abstract

The present invention relates to a method for preparing retro-reflective sheet with high abrasion resistance produced by initially coating the first coating layer one component type polyurethane (hereinafter refer to PU) resin mixed with reflective particles on the pattern releasing paper with embossed grain, and after drying, further coating the second layer two component type PU resin adhesive agent containing colorant, then drying; above this, coating a kind of paste; finally, adhering substrate; after pre-drying and curing, divesting releasing paper, using solvent to solve the part of PU resin leaving reflective particles exposed and hardened. The material produced characterized in high abrasion resistance and using soft material as substrate. Use of the retro-reflective material produced by the invention is valuable for commercial fields like coat, vest, shoes, cap, poster, and the like.


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