The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2003

Filed:

Mar. 29, 2000
Applicant:
Inventors:

Yukie Nakazawa, Niigata-ken, JP;

Masamichi Saito, Niigata, JP;

Naoya Hasegawa, Niigata-ken, JP;

Akihiro Makino, Niigata-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/127 ; H04R 3/100 ;
U.S. Cl.
CPC ...
G11B 5/127 ; H04R 3/100 ;
Abstract

A production method for a spin-valve type magnetoresistive element comprising laminating an antiferromagnetic layer, a pinned magnetic layer, a non-magnetic electrically conductive layer, a free magnetic layer, and a second antiferromagnetic layer. The second antiferromagnetic layer is located on the free magnetic layer and orients the magnetization direction of the free magnetic layer. In this method, a first thermal treatment is performed at a first temperature of ordering a crystal structure of the first antiferromagnetic layer or at a second temperature lower than a second blocking temperature of the second antiferromagnetic layer. After the first thermal treatment, a second thermal treatment is performed at a third temperature lower than a first blocking temperature of the first antiferromagnetic layer but higher than said second blocking temperature of the second antiferromagnetic layer.


Find Patent Forward Citations

Loading…