The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2003
Filed:
Apr. 05, 2001
Applicant:
Inventors:
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/3223 ;
U.S. Cl.
CPC ...
G01N 2/3223 ;
Abstract
An open chamber-type X-ray fluorescence analysis apparatus is provided to analyze a large-sized sample located outside the open chamber. The apparatus has a helium inlet provided in the open chamber for injecting helium gas into the chamber to replace gas within the chamber with helium, a film attaching/removing mechanism for covering the opening in the chamber with a film having high transmittance with respect to X-rays, and a gas outlet provided in the chamber for allowing gas to exit the chamber.
Quick Actions:
Matoba, Yoshiki. (2003). Open chamber-type x-ray analysis apparatus (U.S. Patent No. 6590955). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6590955
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile