The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2003
Filed:
Apr. 26, 2001
Akira Ikushima, Nagoya, JP;
Kazuya Saito, Nagoya, JP;
Takashi Miura, Aichi-ken, JP;
Shogo Nasuda, Inazawa, JP;
Kitagawa Industries Co., Ltd., Nagoya, JP;
Abstract
A processing method of a silica glass fiber, which is applicable to a long fiber, to improve its UV resistance by UV irradiation and heat treatment. Initially, a heating furnace is positioned such that the left end of the silica glass fiber is within the heating furnace Then, the heating furnace is moved toward the right, while UV is irradiated with a UV source to the left end surface of the silica glass fiber. Since the silica glass becomes transparent due to removal of structural defects that have been caused by the UV irradiation, the UV travels further forward and causes other structural defects there. When the heating furnace is moved there, the structural defects are removed and the silica glass fiber becomes transparent. By repeating these steps, the fiber is processed throughout length. Thus, mass production becomes possible and an improvement of productivity and lower costs can be achieved.