The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2003
Filed:
Dec. 27, 2000
Won-Il Jeong, Kyongsangbuk-du, KR;
Young-Min Baik, Kyongsangbuk-du, KR;
Samsung Electronics Co, Ltd., Suwon, KR;
Abstract
Disclosed is a method for controlling a heat treatment in the process of fabricating a high purity silica glass via a sol-gel process using a low temperature heater having an inhalation line and an exhaust line. Accordingly, the method includes the steps of (a) identifying whether or not the diameter of the exhaust line is varied; (b) controlling the mass flow of the process gas according to the changed diameter of the exhaust line in step (a); (c) measuring an exhaust gas velocity discharged through the exhaust line; (d) comparing the exhaust gas velocity measured in the step (c) with the exhaust gas velocity after the scale of the exhaust line is varied; and, (e) repeating steps (b)-(d) if the comparison result in step (d) is different.