The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Aug. 16, 2001
Ilan Blech, Los Altos, CA (US);
Omar Leung, Palo Alto, CA (US);
Silicon Light Machines, Sunnyvale, CA (US);
Abstract
The current invention is directed to devices and systems with patterned reflective surfaces. The reflective surfaces are patterned with primary reflective regions and gap regions. The gap regions provide for separation between reflective material within adjacent primary reflective regions. The separation between reflective material reduces atomic flux which can lead to the depletion of the reflective material within regions of the reflective surface that are exposed to an intense light source. The primary reflective regions are preferably formed from a reflective material such as aluminum, silver, gold or platinum. The gap regions are left vacant or deposited with second material which is non-reflective, reflective or semi-reflective. The patterned reflective surface is preferably formed on a micro-structure, such an elongated ribbon. The patterned ribbon structure is preferably one of a plurality patterned ribbon structures in a grating light valve device.