The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2003

Filed:

Feb. 16, 2000
Applicant:
Inventors:

Seiji Kamimura, Kokubunji, JP;

Isamu Takekoshi, Edogawa, JP;

Yasushi Terui, Tsuchiura, JP;

Yasuaki Takada, Kodaira, JP;

Takayuki Nabeshima, Kokubunji, JP;

Minoru Sakairi, Tokorozawa, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 4/900 ; H01J 4/928 ; B01D 5/944 ;
U.S. Cl.
CPC ...
H01J 4/900 ; H01J 4/928 ; B01D 5/944 ;
Abstract

A compact, easy-to-use device is provided which takes in a sample over a shorter distance, the sample introducing time is shortened, and contamination is prevented when the sample is introduced. A burner for generating a plasma, a deflecting portion provided with parallel electrodes for deflecting ions, and an analyzer room for performing mass separation of the deflected ions, these being disposed in a plane in the horizontal direction, and a sample setting portion for setting a sample, a peristaltic pump for aspirating the sample and the burner for introducing and burning the aspirated sample are disposed in a plane in the vertical direction relative to the aforesaid plane. The sample is supplied to the burner from below, and the ions generated by the plasma are made to flow on a horizontal plane.


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