The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Apr. 06, 2000
Applicant:
Inventors:
Yoshinori Tanaka, Hyogo, JP;
Mitsuya Kinoshita, Hyogo, JP;
Shinya Watanabe, Hyogo, JP;
Tatsuo Kasaoka, Hyogo, JP;
Moriaki Akazawa, Hyogo, JP;
Toshiaki Ogawa, Hyogo, JP;
Assignee:
Mitsubishi Denki Kabshiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1311 ;
U.S. Cl.
CPC ...
H01L 2/1311 ;
Abstract
A contact hole having an opening diameter smaller than the minimum dimension that can be formed by photolithographic technique is formed. Using an interlayer insulating film formed on a semiconductor substrate as an etching mask, etching is carried out halfway to form an opening . The etching mask is removed, and a TEOS film is formed on the interlayer oxide film . The whole surface is then etched anisotropically to form a contact hole