The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Dec. 11, 2000
Applicant:
Inventors:
Yasufumi Uno, Yamanashi, JP;
Toru Inoue, Nagano, JP;
Tetsuya Mino, Chiba, JP;
Koji Matsukuma, Hyogo, JP;
Assignee:
TDK Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 ; B44C 1/22 ;
U.S. Cl.
CPC ...
B05D 5/12 ; B44C 1/22 ;
Abstract
A method of patterning at least one object layer, includes a step of forming a mask on the object layer, and a step of selectively etching the object layer using the mask. The mask is made of a magnetic metallic compound with a basic metal of nickel or cobalt containing at least group 3B element and/or group 5B element.
Uno, Yasufumi. (2003). Patterning method using mask and manufacturing method for composite type thin film magnetic head using the patterning method (U.S. Patent No. 6586049). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6586049
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile