The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Mar. 26, 1999
Applicant:
Inventors:
Hirohisa Kikuyama, Osaka-fu, JP;
Masayuki Miyashita, Osaka-fu, JP;
Tatsuhiro Yabune, Osaka-fu, JP;
Tadahiro Ohmi, Miyagi-ken, JP;
Assignee:
Stella Chemifa Kabushiki Kaisha, Osaka-Fu, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 1/308 ;
U.S. Cl.
CPC ...
C09K 1/308 ;
Abstract
An etching treatment agent which can etch insulating film with high speeds without damaging the resist pattern, provide realistic throughput when the insulting film etching process in the semiconductor manufacturing process is replaced with the single wafer processing etching treatment method, and prevent roughness on the surface of the semiconductor after etching.