The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2003

Filed:

Jan. 16, 2001
Applicant:
Inventor:

Toshio Inada, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract

A DRAM macro-cell designing method. The method includes a step of producing arrangement templates and a step of disposing leaf cells. In the step of producing arrangement templates, when a plurality of types of leaf cell are to be disposed to form a DRAM macro-cell, arrangement templates which are stratified into high order and low order are produced on the basis of parameters of the DRAM macro-cell such that, of the plurality of types of leaf cell, leaf cells of the same type are concatenatedly disposed. In the step of disposing leaf cells, a low-order template is employed to dispose predetermined leaf cells to produce a new leaf cell, and a high-order template is employed to dispose at least one of the new leaf cell. Consequently, it is possible to efficiently design a layout of a DRAM macro-cell without increasing a number of arrangement templates.


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