The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Sep. 05, 2000
Emma Jane Clarissa Dawnay, Didcot, GB;
Arnold Peter Roscoe Harpin, Oxford, GB;
Ian Edward Day, Oxford, GB;
Bookham Technology plc, Oxfordshire, GB;
Abstract
A doped slab region is described for use around a ridge waveguide, for controlling the refractive index of the waveguide material. Instead of simply diffusing dopant in from a surface of the slab region adjacent the waveguide, an area of the slab region is etched and dopant diffused in from a side face of the etched region. Thus, the dopant profile is established from a horizontal direction, allowing the profile to be controlled. A simple vertically uniform doping profile can thus be provided, leading to a vertically uniform current density, or an anisotropic wet etch can be applied after the initial etch to provide a profile which concentrates the current density at a selected height in the slab region.