The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Jan. 03, 2001
Tatsumi Sato, Kyoto, JP;
Shimadzu Corporation, Kyoto, JP;
Abstract
In a double beam spectrophotometer, a sample beam is irradiated to a large-sized sample in a substantially vertical direction, and the beam upwardly transmitted through the large-sized sample is reflected by a reflecting mirror and sent to an integrating sphere including a detector. A reference beam irradiated parallel to the sample beam is deflected by reflecting mirrors such that the reference beam goes around the large-sized sample, and guided to the integrating sphere. Thus, a holder is not required to correspond to a size or shape of the sample, and measurement position can be freely changed by moving the sample. Also, in case of utilizing a conventional standard sample chamber, movable reflecting mirrors are inserted in the optical paths to transfer the beams to the standard sample chamber.