The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2003

Filed:

Nov. 19, 2001
Applicant:
Inventors:

Wing C. Yip, Chai Wan, HK;

Elena K. Prudnikova, Kowloon, HK;

Hoi S. Kwok, Kowloon, HK;

Vladimir G. Chigrinov, Kowloon, HK;

Vladimir M. Kozenkov, Kowloon, HK;

Hirokazu Takada, Sakura, JP;

Masanobu Fukuda, Okegawa, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08J 7/18 ; B05D 3/02 ; B05D 3/06 ; B05D 5/06 ; G02F 1/1337 ;
U.S. Cl.
CPC ...
C08J 7/18 ; B05D 3/02 ; B05D 3/06 ; B05D 5/06 ; G02F 1/1337 ;
Abstract

A photo-alignment layer having excellent long-term stability to light and heat is manufactured by coating a material for the photo-alignment layer, which contains a dichroic dye having two or more polymerizable groups per molecule, on a substrate, and exposing the coating layer to polarized light, thereby imparting a photo-alignment function, and polymerizing the polymerizable groups by heating or light exposure.


Find Patent Forward Citations

Yip, Wing. (2003). Method of manufacturing photo-alignment layer (U.S. Patent No. 6582776). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6582776

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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