The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Sep. 30, 1999
Randall S. Mundt, Pleasanton, CA (US);
Lam Research Corporation, Milpitas, CA (US);
Abstract
An inventive method for optically detecting a trench depth in a wafer is disclosed. The method includes detecting a first maxima in the intensity of a multi-wavelength light source, a portion of the light being reflected from the top trench surface of a wafer. A second maxima is then detected in the intensity of the multi-wavelength light source, a portion of which being reflected from the bottom trench surface of a wafer. The method further includes determining a maxima peak difference between the first maxima and the second maxima, wherein the trench depth corresponds to the maxima peak separation. The invention provides a robust, cost effective method for trench depth detection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile