The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Aug. 20, 2001
Applicant:
Inventors:
Mohan Chandra, Merrimack, NH (US);
Yuepeng Wan, Nashua, NH (US);
Assignee:
G.T. Equipment Technologies, Inc., Nashua, NH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B28D 2/300 ;
U.S. Cl.
CPC ...
B28D 2/300 ;
Abstract
A method for producing formed semiconductor articles with predefined shapes such as core tubes for CVD production of bulk polysilicon. The method is characterized by thermal spray deposition of the semiconductor material in a on a temperature controlled rotating mandrel that is shaped complementarily to the desired article shape, and by later separation of the formed semiconductor body from the mandrel by thermal contraction, melting, or chemical reduction of the mandrel size.