The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
May. 08, 2001
Applicant:
Inventors:
Masayuki Yoneda, Shiga-ken, JP;
Yoshihiro Koshido, Kanazawa, JP;
Makoto Tose, Moriyama, JP;
Masatoshi Nakagawa, Kyoto, JP;
Assignee:
Murata Manufacturing Co., Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04R 1/700 ;
U.S. Cl.
CPC ...
H04R 1/700 ;
Abstract
A method of forming an electrode film using a vacuum deposition apparatus, includes the steps of depositing a refractory metal on a substrate after reaching a back pressure in a deposition chamber at a pressure that is within a range of about 1×10 Pa to about 5′10 Pa, and annealing the substrate on which the metal is deposited to decrease the electrical resistivity of the electrode film.