The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2003

Filed:

Feb. 05, 2002
Applicant:
Inventors:

Lars Bartelt-Berger, Oppenweiler, DE;

Albrecht Kuke, Auenwald, DE;

Raimund Fritscher, Burgstetten, DE;

Helmut Reppe, Leinfelden-Echterdingen, DE;

Werner Scholz, Weissach, DE;

Ralpf Sommerfeldt, Backnang, DE;

Assignee:

Tesat SpaceCom GmbH KG, Backnang, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 2/642 ;
U.S. Cl.
CPC ...
B23K 2/642 ;
Abstract

Mounting method for a miser laser having a miser crystal on the base surface of a housing, which has a side wall with a housing window for the miser exit beam, is provided. A reference beam is directed through the housing window on to the crystal end face of the miser crystal with an inverted light beam direction which the miser beam to be generated is later to have. An adjusting device which permits mutually independent movements, on the one hand in a direction parallel to the reference beam, and on the other hand perpendicular thereto and parallel to the housing base, and also permits rotations about an axis of rotation perpendicular to the housing base, is used to preadjust the premounted miser stack such that the angle between the surface normal of the crystal end face and the reference beam is approximately 45°, and the reference beam strikes the crystal end face approximately at its center. In the as yet not optimally adjusted case, all the reflections are united on a display screen by displacing the miser transverse to the direction of the reference beam and by rotation.


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