The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2003
Filed:
Mar. 07, 2000
Applicant:
Inventors:
Masafumi Hiraishi, Shiga, JP;
Kazunori Sawai, Shiga, JP;
Assignee:
Kaneka Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/10 ;
U.S. Cl.
CPC ...
G06F 7/10 ;
Abstract
Disclosed is a method of controlling a manufacturing process of a photoelectric conversion apparatus, comprising putting a mark for controlling the manufacturing process in a peripheral region on a surface of a transparent substrate or in that region of a side surface of the transparent substrate, which is not irradiated with the laser beam used for the laser-scribing of each of a transparent electrode layer, a semiconductor layer and a reverse electrode layer, the mark being read in the subsequent process and the subsequent process being controlled by utilizing the mark thus read.