The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2003
Filed:
Jun. 13, 2000
Jérôme Primot, Chatillon, FR;
Nicolas Guerineau, Antony, FR;
ONERA (Office National d'Etudes et de Recherches Aerospatiales), Chatillon, FR;
Abstract
In a process for analyzing the wavefront of a light beam, a diffraction grating with rectangular meshing is placed in a plane perpendicular to the light beam to be analyzed and optically conjugate with the analysis plane. Different emergent beams from the grating interfere to form an image whose deformations are related to the slopes of the wavefront analyzed. The grating multiplies an intensity function, implemented by a two-dimensional intensity grating, which defines a rectangular meshing of sub-pupils transmitting the light from the beam to be analyzed into a plurality of emergent beams disposed in accordance with a rectangular meshing, with a phase function implemented by a two-dimension phase grating which introduces a phase shift between two adjacent emergent beams such that the two emergent beams are in phase opposition.