The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2003

Filed:

Jul. 25, 2001
Applicant:
Inventor:

Leonard R. Rockett, Washington, DC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/972 ;
U.S. Cl.
CPC ...
H01L 2/972 ;
Abstract

A CMOS SRAM cell with prescribed power-on data state having first and second cross-coupled inverters each defined by serially connected complementary MOS transistors (T /T ; T /T ) serially connected between V and circuit ground to form a first inverter with a first data node (A) between the two transistors (T /T ) of the first inverter, and, in a similar manner, to form a second inverter with a second data node (B) between the two transistors (T /T ) of the second inverter. The gates of transistors of each inverter are connected together and cross-coupled to the data node of the other inverter. An access transistor (T ) is connected between a bit line (BL) and the first data node (A) and another access transistor (T ) is connected between a complementary bit line (BLC) and the second data node (B) to provide data access thereto. A diode (D) is connected in the gate circuit between the complementary P and N type MOS transistors of one of the two latches to change the gate charge time to assure that each latch will assume a pre-determined state upon power-up. The diode (D) can be implemented in dual work function polysilicon topologies by selectively doping adjacent regions of the single gate level polysilicon with an appropriate polysilicon doping type and concentration for each transistor type to form a PN junction ( ) in the polysilicon ( ). A window or opening ( ) is formed in the silicide strapping layer ( ) to enable the PN junction ( ) operation.


Find Patent Forward Citations

Rockett, Leonard. (2003). Cmos sram cell with prescribed power-on data state (U.S. Patent No. 6576962). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6576962

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…