The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2003
Filed:
Dec. 05, 2001
Applicant:
Inventors:
Roy Ray Odle, Mt. Vernon, IN (US);
Thomas Link Guggenheim, Mt. Vernon, IN (US);
Philip L. Angermeier, Mt. Vernon, IN (US);
Assignee:
General Electric Company, Pittsfield, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D / ; C07D / ;
U.S. Cl.
CPC ...
C07D / ; C07D / ;
Abstract
A process for the formation of halophthalic anhydrides and halogen substituted-n-alkyl-phthalimides from the corresponding substituted-n-alkyl-tetrahydrophthalimide by passing said substituted-n-alkyl-tetrahydrophthalimide over a metal catalyst, in the gaseous phase in the presence of oxygen. By selection of the reaction temperature and reaction time, high conversions and purity of the anhydride or imide can be selectively obtained.