The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2003
Filed:
Oct. 19, 1998
John Chin-Hsiang Lin, Kaohsung, TW;
Vanguard International Semiconductor Corporation, Hsin-Chu, TW;
Abstract
A dynamic mask exposure method and system includes a support for a workpiece, a source of a beam of exposure radiation, and a transmissive dynamic mask with orthogonally arranged matrices of actuator lines and binary pixel units which are opaque or transparent as a function of control inputs to the actuator lines, the transmissive dynamic mask having a top surface and a bottom surface. A control system is connected to supply pixel control signals to the actuator lines of the transmissive dynamic mask to form a scanning pattern of transparent regions and opaque regions which scans across the dynamic mask. The beam is directed down onto the top surface of the mask and through a slit in a diaphragm onto the workpiece. The beam passes through the transparent regions and projects a pattern from the mask onto the support where the workpiece.