The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2003
Filed:
Feb. 28, 2002
Tihiro Ohkawa, La Jolla, CA (US);
Archimedes Technology Group, Inc., San Diego, CA (US);
Abstract
A plasma mass filter having features to prevent plasma loss through one end of the filter and thereby increase energy efficiency includes a cylindrical wave guide to surround a plasma. Coil(s) and electrode(s) are provided to establish crossed electric and magnetic fields within the wave guide to separate plasma ions according to their mass. A circularly polarized electromagnetic wave having specific characteristics is launched through a first end of the wave guide and into the plasma to generate ponderomotive forces on the plasma particles via photon reflection. These forces cause the plasma particles to move towards the second end of the wave guide and thus prevent plasma loss through the first end of the wave guide. This structure allows feed plasma to be continuously introduced into the first end of the wave guide for separation therein. A resonance cavity is provided to redirect the reflected photons back into the plasma.