The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2003

Filed:

Oct. 27, 2000
Applicant:
Inventors:

Axel Scherer, Laguna Beach, CA (US);

Joyce Wong, Pasadena, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/34 ; C25D 5/02 ; C25D 1/700 ; H01L 2/13205 ;
U.S. Cl.
CPC ...
C25D 5/34 ; C25D 5/02 ; C25D 1/700 ; H01L 2/13205 ;
Abstract

By using electron beam lithography, chemically assisted ion beam etching, and electroplating, high aspect ratio magnetic columns, 60 nm-170 nm in diameter, which are embedded in an aluminum-gallium-oxide/gallium-arsenide (Al Ga ) /GaAs heterostructured substrate, are fabricated. Storage of data in electroplated Ni columns is realized in the form of tracks 0.5 &mgr;m and 0.25 &mgr;m in the down-track direction, and 1 &mgr;m in the cross-track direction, corresponding to areal densities of 1.3 and 2.6 Gbits/in respectively. The fabrication of patterned media samples, using dry etching and oxidation of AlGaAs, and electrodeposition of Ni into GaAs substrate is realized.


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