The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2003
Filed:
Sep. 21, 2001
Ming Lai, Dublin, CA (US);
Jay Wei, Fremont, CA (US);
Scott A. Meyer, Livermore, CA (US);
James P. Foley, Fremont, CA (US);
Jochen M. Horn, Pleasanton, CA (US);
Carl Zeiss Ophthalmic Systems, Inc., Dublin, CA (US);
Abstract
Embodiments of the present invention provide a method and apparatus for measurement of aberration of an eye. One or more embodiments provide an aberration measurement instrument that enables measurement wherein Hartmann-Shack spots have reduced speckle; one or more embodiments provide an aberration measurement instrument that enables measurement of an eye having a large diopter power variation over different zones of the eye; one or more embodiments provide an aberration measurement instrument that enables measurement with accommodation control; one or more embodiment provide an aberration measurement instrument wherein radiation reflected by a cornea and radiation scattered by intra-ocular elements are blocked; and one or more embodiment provide an aberration measurement instrument wherein a hazy background produced by radiation multiply scattered within an eye is reduced.