The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2003
Filed:
Aug. 31, 2001
Applicant:
Inventor:
Hiroaki Takeishi, Tochigi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ;
U.S. Cl.
CPC ...
G03B 2/752 ;
Abstract
A scan exposure apparatus includes a mask stage on which a mask is to be placed, a substrate stage on which a substrate is to be placed, and a detection unit for detecting a surface shape of the substrate in each of a plurality of areas thereof. The surface shape is taken into consideration to drive the substrate stage in an exposure process. The apparatus further includes a controller for deciding scanning speeds of the mask stage and the substrate stage for each of a plurality of the areas based on the result of detection by the detection unit so as not to exceed a predetermined value of a synchronization error between the mask stage and the substrate stage.