The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2003
Filed:
Sep. 30, 2000
Applicant:
Inventors:
Thomas Hanemann, Stutensee, DE;
Jürgen Hausselt, Germersheim, DE;
Assignee:
Forschungszentrum Karlsruhe GmbH, Karlsruhe, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/40 ; G03F 7/075 ; C08F 2/46 ;
U.S. Cl.
CPC ...
G03F 7/40 ; G03F 7/075 ; C08F 2/46 ;
Abstract
In a method for the manufacture, by means of lithography, of ceramic small and micro-parts, a pre-ceramic silicon containing polymer layer is deposited on a highly temperature resistant substrate and then dried at room temperature. The layer is then exposed in an image pattern to electromagnetic radiation and the exposed layer is developed in an organic solvent to remove the non-exposed areas. The preparation is then pyrolyzed at more than 900° C. and finally sintered at a temperature of at least 1600° C. to form a ceramic structured layer on the substrate.