The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2003
Filed:
Jul. 03, 2000
Radislav Alexandrovich Potyrailo, Niskayuna, NY (US);
John Patrick Lemmon, Delanson, NY (US);
William Patrick Flanagan, Rexford, NY (US);
Roger Neal Johnson, Hagaman, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
The present invention is directed to a method and apparatus for rapid screening of potential reactants, catalysts, or associated process conditions. In one embodiment, the method includes the steps of providing a reaction substrate having at least one substrate reservoir and introducing a reactant system at least partially embodied in a liquid into the substrate reservoirs. The reactant system is heated to at least one predetermined temperature. A flow of inert gas is provided through a manifold above the substrate reservoir. The reaction in the substrate reservoir can be monitored, e.g., visually or spectrophotometrically during the course of the reaction, or the reaction substrate block can be rapidly cooled to stop the reaction in the substrate reservoir prior to analysis.