The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2003
Filed:
Jun. 05, 2001
Bruce Martin Levine, Arcadia, CA (US);
Metrologic Instruments, Inc., Blackwood, NJ (US);
Abstract
An improved ophthalmic instrument including an integral wavefront sensor and display device, wherein the wavefront sensor measures phase aberrations in reflections directed thereto to characterize aberrations of the eye and is operably coupled to the display device, which displays a graphical representation of the aberrations of the eye. Such graphical representation may include: two dimensional contour maps that graphically depict contribution of pre-specified terms (such as spherical aberration, astigmatism and coma) for the aberrations of the eye, coefficients corresponding to such pre-specified terms that characterize the aberrations of the eye, or predefined two-dimensional icons that provide a general graphical depiction of such prespecified terms. Such graphical representations provide the practitioner with valuable information characterizing the high order optical errors of the eye (which is far beyond the diopter information typically provided by current ophthalmic instruments) for use in diagnosis and treatment of abnormalities and disease in the eye.