The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2003
Filed:
Jul. 25, 2000
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A semiconductor manufacturing system and method includes an exposure value detector for detecting an exposure value, a pattern size detector for detecting a pattern size, a size comparator for calculating a size difference between the pattern size and a target value, an optimum exposure value calculator for calculating an optimum exposure value based on the exposure value and the size difference, an exposure value controller. In this semiconductor device manufacturing method, the optimum exposure value is calculated based on the exposure value and the size difference, and exposure is performed at the optimum exposure value. A semiconductor device is manufactured by the manufacturing method.