The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2003
Filed:
Feb. 28, 2001
Georg Ankerhold, Lübeck, DE;
Abstract
An optical gas-measuring system and process identifies especially infrared-active individual gases over a measuring path of about m and to determine their concentration averaged over the measuring path swept. The laser source ( ) emits a divergent ray beam, from which both the measuring beam and the reference beam are formed after a single-time reflection of the emitted ray beam. A first radiation reflector ( ) is designed in the form of a first hollow mirror for the reflection of a first part of the ray beam emitted from the laser source ( ) as a measuring beam into the open optical measuring path. A second radiation reflector ( ) is designed in the form of a second hollow mirror for the reflection of a second part of the ray beam emitted from the laser source ( ) as a reference beam into a reference gas cuvette ( ) containing the reference gas sample for the gas to be measured. A third radiation reflector ( ) is designed in the form of a third hollow mirror for the reflection of the measuring beam received after passing through the optical measuring path onto a first radiation detector ( ).