The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2003
Filed:
Jan. 19, 2001
Applicant:
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/00 ; C12Q 1/68 ; C12P 1/934 ; C07H 2/102 ; C07H 2/104 ;
U.S. Cl.
CPC ...
C12M 1/00 ; C12Q 1/68 ; C12P 1/934 ; C07H 2/102 ; C07H 2/104 ;
Abstract
This invention provides a pattern exposure method which may be used for effectively preparing, for example, a DNA or peptide array with a lower cost and a device therefor. Specifically, the method is a method for pattern exposure comprising the step of exposing a photosensitive material on a solid-phase substrate by irradiating it with a light as a pattern, wherein the photosensitive material is selectively exposed with beams selectively emitted from multiple vertical cavity surface emitting laser sources aligned as an array.