The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2003
Filed:
Feb. 14, 2002
Applicant:
Inventors:
Hans-Joachim Timpe, Osterode, DE;
Ulrich Fiebag, Nienstadt, DE;
Assignee:
Kodak Polychrome raphics LLC, Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/30 ;
Abstract
A replenisher composition developing exposed radiation-sensitive printing plate precursors for plate/developer systems in which the electrical conductivity of the developer does not decrease to the same extend as the activity of the developer decreases or even increases is disclosed. A method for developing exposed radiation-sensitive printing plates using the replenisher composition is also disclosed.