The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2003
Filed:
Mar. 01, 2001
Applicant:
Inventors:
Yuji Nozaki, Kanagawa, JP;
Yasuki Kimura, Tokyo, JP;
Assignee:
Oki Electric Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A method for forming a photo-mask includes forming a light-shielding layer on a substrate, coating a resist film on the light-shielding layer, exposing the resist film with low dosage, and inclining a resist profile after developing the exposed resist film. Accordingly, an opening dimension of the light-shielding layer can be designed without depending on the location of the region with respect to the formed resist pattern of the photo-mask.