The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2003

Filed:

Jun. 19, 2000
Applicant:
Inventors:

Hans Biebuyck, Rockville, MD (US);

Bruno Michel, Adliswil, CH;

Heinz Schmid, Waedenswil, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/14 ; G03F 7/20 ;
U.S. Cl.
CPC ...
G03F 1/14 ; G03F 7/20 ;
Abstract

Optical lithography scheme making use of light coupling structures, and elastomeric light coupling structures in particular. These light coupling structures comprise protruding portions and connecting portions. The protruding elements are designed to be brought into conformal contact with a resist to be exposed such that the light guided into the protruding elements is coupled from there directly into the resist. The lateral shape and size of the protruding elements defines 1:1 the lateral size and shape of small features to be exposed in the resist.


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Biebuyck, Hans. (2003). Optical lithography beyond conventional resolution limits (U.S. Patent No. 6569575). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6569575

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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