The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2003

Filed:

Feb. 23, 1999
Applicant:
Inventor:

Takashi Takeda, Ogasa-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 3/44 ; C11D 3/20 ; C23G 1/24 ;
U.S. Cl.
CPC ...
C11D 3/44 ; C11D 3/20 ; C23G 1/24 ;
Abstract

The present invention relates to a cleaner for lithography which is excellent in the ability to dissolve a resist and highly safe to the human body and which can be used usefully to clean a coater such as in a coater cup, to remove an unnecessary resist from a substrate when or after coating of a resist, to remove the resist from the substrate after the object using the resist was achieved, and to clean and rinse the substrate after removal of the resist. The cleaner for lithography comprises a homogeneous solution of at least one organic solvent selected from the group consisting of propylene glycol alkyl ether, propylene glycol alkyl ether acetate, ethylene glycol alkyl ether, ethylene glycol alkyl ether acetate, acetic acid alkyl ester, propionic acid alkyl ester, alkoxypropionic acid alkyl ester, lactic acid alkyl ester, aliphatic ketone, and alkoxybutanol and at least one selected from alcohols having alkyl group with 1 to 4 carbon atoms.


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