The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2003
Filed:
Mar. 01, 1999
Keiji Fuse, Osaka, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
In the design of a lens system, lens parameters are determined by minimizing a merit function which is a sum of squares of ray aberrations or wavefront errors at many sampling points. Prior methods often select the parameters which give very narrow tolerances to production errors. The small tolerance increases the difficulty of production. In order to increase the tolerances, states which allot errors ±&dgr; to some chosen parameters are considered. Merit functions corresponding the error-allotted states are made. An integrated merit function is produced by adding the error-allotted merit functions to the non-error allotted normal merit function. Parameters are determined by minimizing the integrated merit function. The optimized parameters will give wider tolerances for the error-allotted parameters. DOE (diffraction optical elements) design includes the steps of considering error-allotted states S , S , . . . in addition to a non-error state S , making merit functions E , E , . . . for S , S , . . . besides E for S , defining an integrated merit function E=&Sgr;w E by multiplying the merit function with weights and summing up, minimizing the integrated merit function and determining optimum variables for the DOE.