The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2003
Filed:
Jul. 26, 2001
Applicant:
Inventor:
Ching-Bore Wang, Fremont, CA (US);
Assignee:
Micro Lithography, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
Photomasks for photolithographic processes are described that incorporate a protective amorphous poly(fluorocarbon) film on their surface, the film serving to reduce contamination at the photomask surface. The preparation of the coated photomasks is also described, as is their use in a photolithographic process.