The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2003

Filed:

Oct. 17, 2000
Applicant:
Inventors:

R. Roger Ruan, Arden Hills, MN (US);

Paul L. Chen, Roseville, MN (US);

Anrong Ning, Tianjin, CN;

Richard L. Bogaard, Park Rapids, MN (US);

Donald G. Robinson, Casselton, ND (US);

Shaobo Deng, St. Paul, MN (US);

Hongbin Ma, St. Paul, MN (US);

Chuanshuang Bie, St. Paul, MN (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05E 3/00 ; C07C 1/00 ; C01B 1/310 ; B01J 1/908 ;
U.S. Cl.
CPC ...
H05E 3/00 ; C07C 1/00 ; C01B 1/310 ; B01J 1/908 ;
Abstract

A dielectric barrier discharge system includes first and second non-thermal plasma reactors which are coupled together in series. The first reactor includes a first surface discharge electrode which defines a first discharge path along the first surface discharge electrode. The second reactor includes second and third electrodes which are separated by a gap and define a second discharge path which extends across the gap. The system can be used to decompose hazardous compounds in a liquid or a gas, such as in power plant flue gases.


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