The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2003

Filed:

Jun. 04, 1999
Applicant:
Inventor:

Tue Nguyen, Vancouver, WA (US);

Assignee:

Simplus Systems Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract

A vapor supply apparatus, for use in a semiconductor device manufacturing process, provides high flow conductance and high thermal conductance showerhead plate for supplying various precursors to a reaction chamber. The high flow conductance and high thermal conductance showerhead plate comprises a thick plate for high thermal conductance and variable size delivery hole for high flow conductance. A variation of the high flow conductance and high thermal conductance showerhead plate having the delivery holes tilted outward can be used as a baffle to diffuse the precursor to a large area. A showerhead system using high flow conductance and high thermal conductance showerhead plates is well suitable for delivering liquid precursors.


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