The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2003
Filed:
Dec. 28, 2001
Richard W. Baker, Palo Alto, CA (US);
Johannes G. Wijmans, Menlo Park, CA (US);
Zhenjie He, Fremont, CA (US);
Ingo Pinnau, Palo Alto, CA (US);
Membrane Technology and Research, Inc., Menlo Park, CA (US);
Abstract
A process for treating natural gas or other methane-rich gas to remove excess nitrogen and carbon dioxide simultaneously. The invention relies on membrane separation using nitrogen/methane and carbon dioxide/methane selective membranes. The gas can typically be brought to pipeline specification for both components, without requiring the use of amine scrubbing or other acid gas removal technique. Where water vapor or hydrogen sulfide is present in the raw gas, these contaminants may also be removed to meet pipeline specification in a single operation.