The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Feb. 20, 1998
J. Thomas Shively, Hinsdale, IL (US);
Edward G. Pariser, Oak Park, IL (US);
R. R. Donnelley & Sons Company, Chicago, IL (US);
Abstract
A method of calculating engraving parameters for a gravure cylinder at a desired raster, cell shape and stylus angle given an estimate of the engraving parameters. The method includes inputting a set of initial parameters including an initial raster, an initial cell shape, an initial stylus angle, an initial highlight width, an initial shadow width, an initial channel width and an initial space. The method proceeds by calculating an initial value of a cell volume from the initial parameters. Next, a set of new parameters are inputted including a desired raster, an estimate of a desired highlight width, an estimate of a desired shadow width, an estimate of a desired channel width and an estimate of a desired space. Then, a new value of the cell volume is calculated from the new parameters. Using the volume calculation, the method can be used to: calculate a set of engraving parameters for a gravure cylinder at a new ink cut, calculate the amount of ink solution that a given gravure cylinder will use in making a specified number of impressions, determine the total cost associated with making a specified number of impressions and determine the optimal cell geometry for a gravure cylinder.