The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Feb. 07, 2002
Guy Moshe Cohen, Mohegan Lake, NY (US);
Steven Alan Cordes, Yorktown Heights, NY (US);
Joanna Rosner, Cortlandt Manor, NY (US);
Jeannine Madelyn Trewhella, Peekskill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is provided for the manufacture of micro-structures, such as micro-electromechanical structures (MEMS) or silicon optical benches (SiOB). The method includes using a single mask to pattern two or more cavity areas to be etched into a substrate in different etching steps, and then selectively choosing the cavity areas for etching. In a preferred embodiment, the method includes patterning a substrate to identify a plurality of cavity areas to be etched into the substrate and filling at least one of the cavity areas with a distinctive filler material. Filler material is chemically distinctive in the sense that it can be etched selectively with respect to the other filling materials. At least one of the cavity areas containing a distinctive filler material is then chosen based at least in part on the distinctive filler material. The chosen cavity area is then etched. The methods of the invention produce micro-structures with more accurate cavity areas by minimizing overlay error and avoiding the need for lithography over extreme topography. The micro-structures manufactured by the methods of the invention are also provided herein.