The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Apr. 12, 2001
Applicant:
Inventors:
Hiroaki Takahata, Tokyo, JP;
Hisaji Oyake, Tokyo, JP;
Assignee:
TDK Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 ;
U.S. Cl.
CPC ...
G03F 7/00 ;
Abstract
An optical disk master having a protrusion/depression pattern on its surface is prepared by applying a photoresist layer on a substrate, exposing the photoresist layer to radiation to form a latent image of the protrusion/depression pattern, and developing the latent image. The step of treating the photoresist layer with a surfactant is included prior to the exposing step or between the exposing and developing steps. An optical disk master having a finer pattern can be prepared at a low cost while minimizing any additional burden on the manufacturing system.